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• W2022609541 abstract "Thin films of Ni oxide were deposited by reactive sputtering in argon/oxygen gas mixtures using O 2 flow concentrations ranging from 6 to 100% and their electrochemical and electrochromic properties were examined using dilute acidic (1 M KCl+0.5 mM H 2 SO 4 ) and basic (1 M KOH) aqueous electrolyte solutions. An electrochromic coloration efficiency of 32±5 cm 2 /C was obtained for all the Ni oxide films regardless of O 2 concentration in both KCl+H 2 SO 4 and KOH. The charge capacity and resultant change in the optical density of the Ni oxide films increased with O 2 concentration owing to a decrease in crystal grain size and the resultant increase in the active surface area of the NiO crystal grains. Although the interfacial capacitances of the Ni oxide films in KCl+H 2 SO 4 are 2–3 times less than those in KOH, a maximum change in optical density of 0.57 was obtained in KCl+H 2 SO 4 for a fine-grained Ni oxide film with a thickness of 400 nm sputtered in 100% O 2 ." @default.
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• W2022609541 date "2006-10-01" @default.
• W2022609541 modified "2023-10-17" @default.
• W2022609541 title "Effect of O₂ Flow Concentration during Reactive Sputtering of Ni Oxide Thin Films on Their Electrochemical and Electrochromic Properties in Aqueous Acidic and Basic Electrolyte Solutions" @default.
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• W2022609541 doi "https://doi.org/10.1143/jjap.45.7780" @default.
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