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- W2022666063 abstract "We report the first observation of the concentration of defects produced by hydrogen implantation in silicon changing reversibly. EPR, IR-absorption and electrical measurements were used. It was found that after hydrogen implantation and annealing of a sample at 450–500°C the concentration of shallow donors and the intensity of the IR-absorption bands (3.36 μm, 3.40 μm, and 3.47 μm) changes reversibly upon annealing at a lower temperature, 300°C. The quenching of samples at 100–300°C reversibly changes the concentration of shallow donors in the range 1015 −1017 cm−3. The temperature dependence of the equilibrium concentration of the shallow donors between 100°C and 300°C, as well as the transients following changes in temperature, have been determined. The activation energy for relaxation of a donor to a neutral state and for a transition to an electrically active state are 1.23 eV and 1.74 eV respectively. It has been concluded that the phenomenon is due to interaction of hydrogen atoms and intrinsic defects produced in silicon by hydrogen ion implantation. Two new EPR spectra were also found in our samples." @default.
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- W2022666063 date "1983-05-01" @default.
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- W2022666063 title "Reversible transformation of defects in hydrogen-implanted silicon" @default.
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- W2022666063 doi "https://doi.org/10.1016/0167-5087(83)90866-9" @default.
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