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- W2022772238 abstract "Optical interferometric techniques are used for absolute (calibrated) displacement measurements of focused ion beam (FIB)-fabricated nanoelectromechanical systems (NEMS). FIB nanomachining of bulk Si gives rapidly prototyped cantilever and doubly clamped beam devices. Ion impingement from orthogonal directions allows tailoring of deep, undercut-free gaps between the device layer and the bulk, in turn allowing large amplitude NEMS oscillatory motion, access to a nonlinear readout regime and a new calibration method for optical interferometric displacement detection. The measurements are sensitive enough to determine the thermomechanical noise floor of a bulk FIBed NEMS device with a displacement sensitivity of 166 fm Hz−½, limited by the combination of optical shot noise and detector dark current. This sensitivity, comparable to the state of the art for free-space optical interferometry of NEMS, validates the robustness of the bulk FIB fabrication technique for rapid prototyping of nanoscale mechanical devices." @default.
- W2022772238 created "2016-06-24" @default.
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- W2022772238 date "2010-10-29" @default.
- W2022772238 modified "2023-09-26" @default.
- W2022772238 title "Optical interferometric displacement calibration and thermomechanical noise detection in bulk focused ion beam-fabricated nanoelectromechanical systems" @default.
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- W2022772238 doi "https://doi.org/10.1088/0960-1317/20/11/115038" @default.
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