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• W2022779111 endingPage "968" @default.
• W2022779111 startingPage "962" @default.
• W2022779111 abstract "In a magnetron sputtering system, the negative substrate bias voltage has been used as a basic process parameter to modify the deposition structure and properties of coatings. In this paper we report the effect of bias voltage ranging from −40 V to −90 V on nano-scaled CrN/TiN/CrN/AlN (CrTiAlN) multilayer coatings synthesized on a Mg alloy by a closed-field unbalanced magnetron sputtering ion plating system in a gas mixture of Ar + N2. The technological temperature and atomic concentration in the multilayer coatings were controlled by adjusting the current density of different metal magnetron targets and the plasma optical emission monitor. The composition, crystallographic structure, deposition model and friction coefficient of multilayer coatings were characterized by X-ray photoelectron spectrometry (XPS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and ball-on-disc testing. The experimental results show that the deposition model and friction coefficient of nano-scaled CrTiAlN multilayer coatings were significantly affected by the negative bias voltage (Vb). The nitride species in multilayer coatings mainly involve CrN, AlN and TiN, and XRD analysis shows that the crystallographic structure was face-centered cubic. Under different bias voltage conditions, the multilayer coating composition shows a fluctuation, and the Al and Cr concentrations respond in the opposite sense to the bias voltage, attaining their greatest values at Vb = −70 V. The surface and cross-sectional morphology shows deposition model change from a columnar model into non-columnar model with the increase in negative bias voltage. The friction coefficient of the nano-scaled multilayer coatings at Vb = −55 V stabilize after 10 000 cycles." @default.
• W2022779111 created "2016-06-24" @default.
• W2022779111 creator A5035811517 @default.
• W2022779111 creator A5036733938 @default.
• W2022779111 creator A5055640195 @default.
• W2022779111 creator A5056516274 @default.
• W2022779111 date "2010-03-01" @default.
• W2022779111 modified "2023-10-18" @default.
• W2022779111 title "Deposition of nano-scaled CrTiAlN multilayer coatings with different negative bias voltage on Mg alloy by unbalanced magnetron sputtering" @default.
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• W2022779111 doi "https://doi.org/10.1016/j.vacuum.2010.01.028" @default.
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