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- W2022791173 abstract "A novel calibration method of electron-optics in cell projection method was proposed. The electron-optics of the cell projection method requires more severe reduction ratio and rotation adjustments than the conventional variable-shaped method. This method uses a calibration aperture pattern fabricated in the same silicon shaping mask. The reduction ratio and the rotation of the cell mask have been calibrated within 1% and within several m-rad, respectively. Such a silicon shaping mask was fabricated by new processes using SOI wafer. In the delineation experiment, an ULSI pattern corresponding to 256-Mbit DRAM gate pattern having 0.2 micrometers minimum feature size was exposed. The stitching error of each shot was smaller than 0.02 micrometers ." @default.
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- W2022791173 date "1993-06-24" @default.
- W2022791173 modified "2023-09-26" @default.
- W2022791173 title "<title>Highly accurate calibration method of electron-beam cell projection lithography</title>" @default.
- W2022791173 doi "https://doi.org/10.1117/12.146503" @default.
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