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• W2022791746 abstract "Sputter-deposited amorphous films of a phase-change material (Ge2Sb2Te5) were prepared with various magnetron sputtering powers to determine its influence. Microscopic characteristics indicate that the sputtering power affects the film morphology: high sputtering powers lead to inhomogeneous domain-like patterns. The transition temperature from a metastable phase to a hexagonal phase decreased as the sputtering power increased. However, an analysis of the radial distribution functions indicates that the sputtering power did not have a distinct influence on the inner atomic structure of the amorphous phase. Therefore, a low sputtering power is beneficial to improve the quality of sputtered amorphous films." @default.
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• W2022791746 date "2012-01-01" @default.
• W2022791746 modified "2023-09-25" @default.
• W2022791746 title "The Influence of Sputtering Power on Phase-Change Films" @default.
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• W2022791746 doi "https://doi.org/10.1149/2.024206esl" @default.
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