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• W2022795027 abstract "Metal-fluoride thin films were grown by reacting ${mathrm{XeF}}_{2}$ with polycrystalline vanadium, iron, and copper surfaces at room temperature. X-ray photoelectron spectroscopy was used to ascertain that films of ${mathrm{VF}}_{3},$ ${mathrm{FeF}}_{2},$ and ${mathrm{CuF}}_{2}$ form on the respective substrates. The film growth initially follows the Mott-Cabrera rate law, but then levels off after a self-limiting thickness is attained. The sudden stop in film growth is attributed to the inability of the precursor molecule to dissociate at the surface when the insulator film becomes too thick for electrons from the substrate to transport through. Thicker films grow on iron and vanadium than on copper, which is attributed to different densities of states at the Fermi level." @default.
• W2022795027 created "2016-06-24" @default.
• W2022795027 creator A5004423660 @default.
• W2022795027 creator A5090351221 @default.
• W2022795027 date "2001-02-27" @default.
• W2022795027 modified "2023-10-16" @default.
• W2022795027 title "Self-limiting growth of transition-metal fluoride films from the reaction with<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML display=inline><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant=normal>XeF</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>" @default.
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• W2022795027 doi "https://doi.org/10.1103/physrevb.63.115409" @default.
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