Matches in SemOpenAlex for { <https://semopenalex.org/work/W2022796073> ?p ?o ?g. }
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- W2022796073 endingPage "023012" @default.
- W2022796073 startingPage "023012" @default.
- W2022796073 abstract "Resist line-edge/width roughness is one of the most critical aspects in extreme UV lithography for the 32-nm technological node and below. It is originated by the uncertainties which characterize the lithographic process: source speckle effect, mask line and surface roughness, mirror roughness, flare effect, and resist pattern formation all contribute to the final roughness. In this paper mask and resist line-edge roughness were compared by means of frequency analysis on top-down scanning electron microscopy images: it was found that low frequency mask roughness is well correlated with the power spectral density of the resist roughness. Mask high-frequency components resulted less critical due to the natural cut-off of the optical system. Experimental data for both mask and resist were implemented in the PROLITH stochastic resist model simulator to quantify the mask line edge roughness contribution to the final resist roughness: the results showed that, for the particular lithographic setting used during the exposures, 16% of the low frequency resist roughness component is originated at the mask level. For this reason, mask impact was set as 0.6 nm of the overall line edge roughness resist budget." @default.
- W2022796073 created "2016-06-24" @default.
- W2022796073 creator A5000790986 @default.
- W2022796073 creator A5016766358 @default.
- W2022796073 creator A5025625301 @default.
- W2022796073 creator A5036596808 @default.
- W2022796073 creator A5051148994 @default.
- W2022796073 date "2011-04-01" @default.
- W2022796073 modified "2023-10-16" @default.
- W2022796073 title "Mask absorber roughness impact in extreme ultraviolet lithography" @default.
- W2022796073 cites W1979709927 @default.
- W2022796073 cites W1984772169 @default.
- W2022796073 cites W1991374950 @default.
- W2022796073 cites W2035472190 @default.
- W2022796073 cites W2058425716 @default.
- W2022796073 cites W2066629327 @default.
- W2022796073 cites W2073455725 @default.
- W2022796073 cites W2095179359 @default.
- W2022796073 cites W2096384080 @default.
- W2022796073 cites W2132247877 @default.
- W2022796073 doi "https://doi.org/10.1117/1.3599077" @default.
- W2022796073 hasPublicationYear "2011" @default.
- W2022796073 type Work @default.
- W2022796073 sameAs 2022796073 @default.
- W2022796073 citedByCount "4" @default.
- W2022796073 countsByYear W20227960732012 @default.
- W2022796073 countsByYear W20227960732013 @default.
- W2022796073 countsByYear W20227960732014 @default.
- W2022796073 crossrefType "journal-article" @default.
- W2022796073 hasAuthorship W2022796073A5000790986 @default.
- W2022796073 hasAuthorship W2022796073A5016766358 @default.
- W2022796073 hasAuthorship W2022796073A5025625301 @default.
- W2022796073 hasAuthorship W2022796073A5036596808 @default.
- W2022796073 hasAuthorship W2022796073A5051148994 @default.
- W2022796073 hasConcept C102290492 @default.
- W2022796073 hasConcept C105487726 @default.
- W2022796073 hasConcept C107365816 @default.
- W2022796073 hasConcept C120665830 @default.
- W2022796073 hasConcept C121332964 @default.
- W2022796073 hasConcept C146024833 @default.
- W2022796073 hasConcept C159985019 @default.
- W2022796073 hasConcept C162996421 @default.
- W2022796073 hasConcept C171250308 @default.
- W2022796073 hasConcept C192562407 @default.
- W2022796073 hasConcept C200274948 @default.
- W2022796073 hasConcept C204223013 @default.
- W2022796073 hasConcept C2779227376 @default.
- W2022796073 hasConcept C49040817 @default.
- W2022796073 hasConcept C520434653 @default.
- W2022796073 hasConcept C53524968 @default.
- W2022796073 hasConcept C71039073 @default.
- W2022796073 hasConcept C94263209 @default.
- W2022796073 hasConceptScore W2022796073C102290492 @default.
- W2022796073 hasConceptScore W2022796073C105487726 @default.
- W2022796073 hasConceptScore W2022796073C107365816 @default.
- W2022796073 hasConceptScore W2022796073C120665830 @default.
- W2022796073 hasConceptScore W2022796073C121332964 @default.
- W2022796073 hasConceptScore W2022796073C146024833 @default.
- W2022796073 hasConceptScore W2022796073C159985019 @default.
- W2022796073 hasConceptScore W2022796073C162996421 @default.
- W2022796073 hasConceptScore W2022796073C171250308 @default.
- W2022796073 hasConceptScore W2022796073C192562407 @default.
- W2022796073 hasConceptScore W2022796073C200274948 @default.
- W2022796073 hasConceptScore W2022796073C204223013 @default.
- W2022796073 hasConceptScore W2022796073C2779227376 @default.
- W2022796073 hasConceptScore W2022796073C49040817 @default.
- W2022796073 hasConceptScore W2022796073C520434653 @default.
- W2022796073 hasConceptScore W2022796073C53524968 @default.
- W2022796073 hasConceptScore W2022796073C71039073 @default.
- W2022796073 hasConceptScore W2022796073C94263209 @default.
- W2022796073 hasIssue "2" @default.
- W2022796073 hasLocation W20227960731 @default.
- W2022796073 hasOpenAccess W2022796073 @default.
- W2022796073 hasPrimaryLocation W20227960731 @default.
- W2022796073 hasRelatedWork W2021830192 @default.
- W2022796073 hasRelatedWork W2022796073 @default.
- W2022796073 hasRelatedWork W2029201719 @default.
- W2022796073 hasRelatedWork W2036968101 @default.
- W2022796073 hasRelatedWork W2051062030 @default.
- W2022796073 hasRelatedWork W2052625931 @default.
- W2022796073 hasRelatedWork W2062587467 @default.
- W2022796073 hasRelatedWork W2064596508 @default.
- W2022796073 hasRelatedWork W2076522755 @default.
- W2022796073 hasRelatedWork W2313777033 @default.
- W2022796073 hasVolume "10" @default.
- W2022796073 isParatext "false" @default.
- W2022796073 isRetracted "false" @default.
- W2022796073 magId "2022796073" @default.
- W2022796073 workType "article" @default.