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- W2022876535 abstract "Here we compare the hydrogen incorporation and the optoelectronic properties of hydrogenated polymorphous silicon (pm-Si:H) films deposited by the decomposition of either silane–hydrogen or silane–helium mixtures. The use of He dilution leads to higher deposition rate and films with a lower hydrogen content with respect to hydrogen dilution. On the contrary, hydrogen dilution leads to films with high hydrogen content that show a characteristic infrared stretching band at 2040 cm−1. We propose that this absorption band is due to hydrogen bonded at the surface of crystallites and clusters in a platelet-like configuration. This peculiar hydrogen bonding is related to low temperature hydrogen diffusion, which gives rise to a sharp hydrogen effusion peak at around 420 °C. Interestingly enough, the higher deposition rate in the films from the He-dilution series does not result in degradation of the film’s electronic and transport properties, which are strongly improved with respect to those of standard amorphous silicon. Finally, we report on improvement of the hole transport properties and their homogenization, independent of the deposition conditions, when the films are submitted to repeated light-soaking and annealing cycles." @default.
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- W2022876535 date "2003-05-19" @default.
- W2022876535 modified "2023-10-18" @default.
- W2022876535 title "Structural, optical, and electronic properties of hydrogenated polymorphous silicon films deposited from silane–hydrogen and silane–helium mixtures" @default.
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- W2022876535 doi "https://doi.org/10.1063/1.1571212" @default.
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