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- W2022881350 abstract "The adhesion of sputter-deposited Ta to porous methyl silsesquioxane (MSQ) was investigated with and without molecular caulk technology. Semi-quantitative four-point bending results and Rutherford backscattering spectrometry (RBS) data revealed that the adhesion of the Ta to porous-MSQ is fragile, and adhesion failure occurs at or near the Ta/porous-MSQ interface. The adhesion of Ta to porous-MSQ can be improved by sealing the porous-MSQ surface with a 40 Å thick molecular caulk layer composed of parylene N (PPX). The calculated adhesion energy for Ta/PPX/porous-MSQ structure was about 10.5 J m–2. The molecular caulk layer improves the fracture toughness of the fragile porous-MSQ interphase region due its controllable penetration into the porous material." @default.
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- W2022881350 date "2005-04-01" @default.
- W2022881350 modified "2023-09-26" @default.
- W2022881350 title "Adhesion of Sputter-Deposited Ta to Porous-Methyl Silsesquioxane Pore Sealed with Molecular Caulk" @default.
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- W2022881350 doi "https://doi.org/10.1002/cvde.200404198" @default.
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