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- W2022902411 abstract "A new self-aligned recess metal contact process utilizing photo-CVD SiN as a side-wall between the gate metal and the n + source region has been accomplished for recessed gate GaAs MESFETs with a single lithographic procedure. The process achieves excellent transconductance, G m , of 190∼240 mS/mm for a gate length, L g , of 1.2 µm with keeping the source-gate breakdown voltage as high as 7-14 V." @default.
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- W2022902411 date "1988-04-01" @default.
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- W2022902411 title "Photo-CVD SiN Assisted Self-Aligned Metal Contact Technology for High-Speed GaAs Devices–Recess Gate Structure with High Breakdown Voltage for GaAs FETs–" @default.
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