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- W2022932283 abstract "GaN-based thin-film electroluminescent devices (TF-ELDs) operating in the UV spectral region were fabricated on Al substrates. GaN films were deposited by compound-source molecular beam epitaxy (CS-MBE) technique. During the deposition, the cell temperature of the GaN compound source is one of the key factors for reducing the excess Ga in the films. The UV light emission (peak wavelength 375 nm) corresponding to the near-band-edge emission of hexagonal GaN was observed from GaN-based TF-ELDs. Furthermore, red, green and blue (RGB) lighting pixels were fabricated using UV GaN-based TF-ELDs in combination with RGB phosphors. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2022932283 date "2007-01-01" @default.
- W2022932283 modified "2023-09-26" @default.
- W2022932283 title "Fabrication of GaN-based electroluminescent devices on Al substrates and their application to red, green and blue pixels for flat-panel displays" @default.
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- W2022932283 doi "https://doi.org/10.1002/pssc.200673583" @default.
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