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- W2022983976 abstract "A Microstepper exposure tool for high-resolution imaging applications incorporating the F<SUB>2</SUB> 157nm laser is described. Details are presented of the optical architecture including beams shaping, homogenization and imaging objectives. Results from the high-resolution metrology, workpiece positioning and gas purging subsystems used in the tool are discussed. Use of the Microstepper for 70nm-node deep-iv lithography and submicron micromachining applications is presented." @default.
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- W2022983976 date "2002-02-19" @default.
- W2022983976 modified "2023-09-25" @default.
- W2022983976 title "High-resolution 157-nm imaging for lithography and micromachining applications" @default.
- W2022983976 doi "https://doi.org/10.1117/12.456887" @default.
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