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Matches in SemOpenAlex for { <https://semopenalex.org/work/W2023109966> ?p ?o ?g. }

• W2023109966 endingPage "1512" @default.
• W2023109966 startingPage "1509" @default.
• W2023109966 abstract "The degree of preference of thin anatase TiO2 films prepared by CVD for the <112> orientation was enhanced by pretreating the soda-lime glass substrates with a plasma. The relationships between the preferred orientation and plasma pretreatments were investigated. It was founded that the TiO2 films on the plasma pretreated soda-lime glass substrates exhibited a higher degree of preference for the (112) orientation than those without the pretreatment. To confirm the effect of the plasma pretreatments on the soda-lime glass substrates, TOF-SIMS, contact angle measurement and TEM were used to determine the changes in the components, surface energy and crystallinity of the substrates, respectively. It was found the components added as network modifiers, such as Na+, Ca2+, and K+ ions, was depleted in the surface region of the substrates after the plasma pretreatment, and that the surface energy of the substrates was increased. Finally, it was observed that the substrate surface was changed from an amorphous phase to polycrystalline. To sum up, it was assumed that the surface of the soda-lime glass substrates with their partially crystalline, namely poly-crystalline, structures artificially induced the thin anatase TiO2 films to develop with a <112>-preferred orientation. In conclusion, the plasma pretreatment of the glass substrate caused the TiO2 thin films to exhibit a higher preference for the <112> orientation, thereby optimizing their photocatalytic efficiency." @default.
• W2023109966 created "2016-06-24" @default.
• W2023109966 creator A5015545195 @default.
• W2023109966 creator A5020513868 @default.
• W2023109966 creator A5070614588 @default.
• W2023109966 creator A5076982331 @default.
• W2023109966 date "2007-06-01" @default.
• W2023109966 modified "2023-09-27" @default.
• W2023109966 title "Properties of Preferred Orientation of TiO₂ Thin Film on Plasma Pretreated Substrate" @default.
• W2023109966 cites W11682742 @default.
• W2023109966 cites W1666890712 @default.
• W2023109966 cites W1983735193 @default.
• W2023109966 cites W2007482662 @default.
• W2023109966 cites W2012742921 @default.
• W2023109966 cites W2028026272 @default.
• W2023109966 cites W2092796292 @default.
• W2023109966 cites W2140082567 @default.
• W2023109966 cites W2169177920 @default.
• W2023109966 cites W2324429138 @default.
• W2023109966 doi "https://doi.org/10.4028/www.scientific.net/ssp.124-126.1509" @default.
• W2023109966 hasPublicationYear "2007" @default.
• W2023109966 type Work @default.
• W2023109966 sameAs 2023109966 @default.
• W2023109966 citedByCount "1" @default.
• W2023109966 crossrefType "journal-article" @default.
• W2023109966 hasAuthorship W2023109966A5015545195 @default.
• W2023109966 hasAuthorship W2023109966A5020513868 @default.
• W2023109966 hasAuthorship W2023109966A5070614588 @default.
• W2023109966 hasAuthorship W2023109966A5076982331 @default.
• W2023109966 hasConcept C111368507 @default.
• W2023109966 hasConcept C127313418 @default.
• W2023109966 hasConcept C127413603 @default.
• W2023109966 hasConcept C137637335 @default.
• W2023109966 hasConcept C159985019 @default.
• W2023109966 hasConcept C161790260 @default.
• W2023109966 hasConcept C171250308 @default.
• W2023109966 hasConcept C185592680 @default.
• W2023109966 hasConcept C19067145 @default.
• W2023109966 hasConcept C191897082 @default.
• W2023109966 hasConcept C192562407 @default.
• W2023109966 hasConcept C195839 @default.
• W2023109966 hasConcept C2777289219 @default.
• W2023109966 hasConcept C2777402863 @default.
• W2023109966 hasConcept C42360764 @default.
• W2023109966 hasConcept C46275449 @default.
• W2023109966 hasConcept C55493867 @default.
• W2023109966 hasConcept C56052488 @default.
• W2023109966 hasConcept C65165184 @default.
• W2023109966 hasConcept C8010536 @default.
• W2023109966 hasConceptScore W2023109966C111368507 @default.
• W2023109966 hasConceptScore W2023109966C127313418 @default.
• W2023109966 hasConceptScore W2023109966C127413603 @default.
• W2023109966 hasConceptScore W2023109966C137637335 @default.
• W2023109966 hasConceptScore W2023109966C159985019 @default.
• W2023109966 hasConceptScore W2023109966C161790260 @default.
• W2023109966 hasConceptScore W2023109966C171250308 @default.
• W2023109966 hasConceptScore W2023109966C185592680 @default.
• W2023109966 hasConceptScore W2023109966C19067145 @default.
• W2023109966 hasConceptScore W2023109966C191897082 @default.
• W2023109966 hasConceptScore W2023109966C192562407 @default.
• W2023109966 hasConceptScore W2023109966C195839 @default.
• W2023109966 hasConceptScore W2023109966C2777289219 @default.
• W2023109966 hasConceptScore W2023109966C2777402863 @default.
• W2023109966 hasConceptScore W2023109966C42360764 @default.
• W2023109966 hasConceptScore W2023109966C46275449 @default.
• W2023109966 hasConceptScore W2023109966C55493867 @default.
• W2023109966 hasConceptScore W2023109966C56052488 @default.
• W2023109966 hasConceptScore W2023109966C65165184 @default.
• W2023109966 hasConceptScore W2023109966C8010536 @default.
• W2023109966 hasLocation W20231099661 @default.
• W2023109966 hasOpenAccess W2023109966 @default.
• W2023109966 hasPrimaryLocation W20231099661 @default.
• W2023109966 hasRelatedWork W174295128 @default.
• W2023109966 hasRelatedWork W2033831685 @default.
• W2023109966 hasRelatedWork W2074081798 @default.
• W2023109966 hasRelatedWork W2083897017 @default.
• W2023109966 hasRelatedWork W2091069293 @default.
• W2023109966 hasRelatedWork W2915155911 @default.
• W2023109966 hasRelatedWork W3217742931 @default.
• W2023109966 hasRelatedWork W4205178150 @default.
• W2023109966 hasRelatedWork W2092638633 @default.
• W2023109966 hasRelatedWork W2186696751 @default.
• W2023109966 hasVolume "124-126" @default.
• W2023109966 isParatext "false" @default.
• W2023109966 isRetracted "false" @default.
• W2023109966 magId "2023109966" @default.
• W2023109966 workType "article" @default.