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- W2023129457 abstract "Thin films of erbium oxide show a thickness dependent amorphous-to-crystalline transformation. Both, the amorphous and crystalline phases are found to be nonstoichiometric with respect to oxygen content. electrical measurements of I-U characteristics of these as-grown films in a sandwich configuration, Al-erbium oxide-Al/Au, exhibit a voltage controlled negative resistance region (VCNR). The nature of the characteristic is independent of electrode material, electrode polarity, and vacuum conditions. It is postulated that the inherent nonstoichiometry of the film gives rise to a ‘built in’ localized energy band in the forbidden gap of the oxide films which is responsible for the occurrence of VCNR. Dünne Schichten von Erbiumoxid zeigen einen dickenabhängigen Übergang amorph-kristallin. Es wird gefunden, daß sowohl die amorphe als auch die kristalline Phase nichtstöchiometrisch ist bezüglich des Sauerstoffgehalts. Elektrische Messungen der I-U-Charakteristiken von diesen gewachsenen Schichten in einer Schichtstruktur, Al-Erbiumoxid-Al/Au, ergeben einen spannungsgesteuerten Bereich negativen Widerstands (VCNR). Die Art der Charakteristik ist unabhängig vom Elektrodenmaterial, der Elektrodenpolarität und den Vakuumbedingungen. Es wird angenommen, daß die innere Nichtstöchiometrie der Schichten zu einem „eingebauten”︁ Energieband in der verbotenen Zone der Oxidschicht führt, das für das Auftreten der VCNR verantwortlich ist." @default.
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- W2023129457 date "1978-09-16" @default.
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- W2023129457 title "Effect of nonstoichiometry on the electrical conductivity of erbium oxide films" @default.
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- W2023129457 doi "https://doi.org/10.1002/pssa.2210490147" @default.
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