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• W2023130861 abstract "X-ray photoelectron diffraction (XPD) and synchrotron radiation photoelectron diffraction (SRPD) have been applied to a Si(001)c(4×4)–C surface in order to determine the site of carbon atoms on the surface. The c(4×4)–C surface, which typically appears during the incubation time of carbonization of Si, was prepared by exposing a single-domain Si(001)2×1 surface at 680°C to C2H4 of 1×10−6 mbar for 600 s. XPD revealed that, except for carbon atoms on the topmost layer, carbon atoms occupy the substitutional sites of Si up to the fourth layer and form a Si1−xCx (x≠0.5) alloy layer. SRPD with a resolution of the chemical-shift C 1s components revealed that the carbon atoms present on the topmost layer occupy random sites and thus are not essential elements of the c(4×4) periodicity." @default.
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• W2023130861 date "1999-06-01" @default.
• W2023130861 modified "2023-10-14" @default.
• W2023130861 title "Photoelectron diffraction study of the Si(001)c(4×4)–C surface" @default.
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• W2023130861 doi "https://doi.org/10.1016/s0368-2048(98)00452-6" @default.
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