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• W2023153970 endingPage "16310" @default.
• W2023153970 startingPage "16307" @default.
• W2023153970 abstract "Self-limiting deposition of anatase TiO2 was accomplished by plasma-enhanced atomic layer deposition using TiCl4 and O2. Film growth occurred at a rate of ∼1.35 Å/cycle, independent of temperature. The refractive index increased monotonically with temperature, and the presence of the anatase phase was confirmed by FTIR and XRD for T ≥ 110 °C. Films were free of impurities with respect to FTIR and XPS, and conformal coverage was confirmed by cross-section microscopy. These results show that OH groups, the most common surface termination in ALD, is not required for this process." @default.
• W2023153970 created "2016-06-24" @default.
• W2023153970 creator A5022850992 @default.
• W2023153970 creator A5032015790 @default.
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• W2023153970 date "2009-08-21" @default.
• W2023153970 modified "2023-09-25" @default.
• W2023153970 title "Plasma-Enhanced Atomic Layer Deposition of Anatase TiO₂ Using TiCl₄" @default.
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• W2023153970 doi "https://doi.org/10.1021/jp907266c" @default.
• W2023153970 hasPublicationYear "2009" @default.
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