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• W2023157568 abstract "In situ generated arsenic hydrides are reacted downstream with trimethylgallium (TMGa), both in the presence of and in the absence of a downstream hydrogen afterglow plasma. The homoepitaxial activation energy dramatically changes from 62 kcal/mol for the pure thermal to 21 kcal/mol for the plasma-assisted growth. The carbon incorporation mechanism for the plasma-assisted growth at temperatures less than 400 °C has a distinct activation energy for carbon incorporation of 23 kcal/mol, independent of V-III ratios. At temperatures above 400 °C, the level of carbon incorporated in the films reaches a level that appears to be dependent on the gas-phase precursor V-III ratio. The activation energy of the low-temperature region is consistent with the surface decomposition of arsenic hydrides." @default.
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• W2023157568 date "1992-06-22" @default.
• W2023157568 modified "2023-09-26" @default.
• W2023157568 title "Organometallic vapor‐phase homoepitaxy of gallium arsenide assisted by a downstream hydrogen afterglow plasma in the growth region" @default.
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• W2023157568 doi "https://doi.org/10.1063/1.106750" @default.
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