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• W2023162025 abstract "The microstructure and texture of chromium nitride films reactively sputtered on silicon substrates were investigated using x-ray scattering, pole figures, transmission electron microscopy, and atomic force microscopy. Under the given deposition geometry, the CrN films were shown to develop a in-plane texture. The three preferred crystallographic orientations of the CrN films approximately coincided with the characteristic directions associated with the deposition geometry. There appear to be two regimes that govern the microstructural evolution and texture development for reactively sputtered chromium films. The first one involves the deposition conditions that lead to the formation of a single, stable phase such as stöichiometric CrN (above certain level of nitrogen partial pressure). In this regime, the film growth appears to be controlled by local epitaxy in individual columns, competitive grain growth, and kinetic roughening. The film characteristics resulted from this regime include the development of the in-plane texture, well-organized microstructures with relatively coarse grains, increased surface roughness, and large tensile stress. The second regime involves the transitional region prior to formation of the stable phase CrN in which significant microstructural refinements take place. This transitional region is associated with the thermodynamically metastable phase CrNx or the presence of multiple phases. The continuous renucleations during film growth disrupt the local epitaxy and impede kinetic roughening. This leads to film characteristics manifested by weakened or no texture, ultrafine microstructure (e.g., nanocrystalline structures), reduced surface roughness, and a tendency for residual stress to transit from tensile to compressive." @default.
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• W2023162025 date "2004-12-27" @default.
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• W2023162025 title "Evolution of in-plane texture in reactively sputtered CrN films" @default.
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• W2023162025 doi "https://doi.org/10.1063/1.1823022" @default.
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