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- W2023173368 abstract "ArF excimer lasers are the light source of choice for the next generation of micro-lithographic tools enabling structures below the 130nm technology node. For these lithographic mass production lines Komatsu successfully developed an ArF excimer laser, named G20A, which has a 2kHz pulse repetition rate, 10W average power and 0.5pm (FWHM) spectral bandwidth. G20A has three significantly improved important items: (1) the high resolution line narrowing module, (2) the high power and high repetition rate solid state pulse power module, and (3) the Xe added laser gas yielding an improved overall laser performance. ArF laser spectra were determined with out newly developed high-resolution spectrometer. The instrument function of the spectrometer was measured with a 193nm coherent light source jointly developed with the University of Tokyo. The laser gas composition is one key parameter of excimer laser performance. The deteriorating effect of impurities on ArF performance is e.g. ten times larger than on KrF performance. We observed that added Xe gas, however, has a beneficial effect on the pulse energy and the energy stability at high repetition rates. Experimental results of a currently developed 4 kHz ArF laser are also reported." @default.
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- W2023173368 date "2000-11-06" @default.
- W2023173368 modified "2023-09-23" @default.
- W2023173368 title "<title>High-repetition-rate ArF excimer laser for microlithography</title>" @default.
- W2023173368 doi "https://doi.org/10.1117/12.405749" @default.
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