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- W2023269538 abstract "So far, the CMOS technology roadmap has been consistent with Moore’s law, even if manufacturing photolithographytools are now operating beyond their resolution limit. This has been made feasible at the expense of an intensive jointwork between designers and process people who have successfully enabled double patterning processes. Tools that canprovide photo lithographers with some relief are on their way although not yet in production. Among them, massivelyparallel mask-less electron beam lithography stands out as a serious candidate since it can achieve the required resolutionat the right cost of ownership provided targeted throughput performance is reached. This paper focuses on this lattertechnique and more precisely, reports on simulation works performed using an emulator of the high volumemanufacturing tool being developed by MAPPER Lithography, called MATRIX.In a nutshell, the MATRIX tool will operate using more than 13,000 beams, each one writing a stripe 2μm wide. Eachbeam itself will be composed of 49 individual sub-beams that can be blanked independently in order to write pixels ontothe wafer. The residual placement errors and any current mismatch between the beams will be measured in-situ andcorrected through the data path. In order to validate that this concept can actually work, the authors have built an off-lineemulator of the data treatment performed down to the information sent to the blanker. It has then been plugged into anelectron beam simulator such that the performance on real designs can be tested.In this paper, the methodology used for the corrections is explained as well as the validation process applied. The resultsof an extensive statistical study are presented showing CD, placement and residual scaling errors simulated on a set ofpredefined key structures assuming current and misplacement ranges within the MATRIX tool specifications, applyingvarious correction solutions.Based on the collected data, it is shown that CD uniformity on the MATRIX tool is better than +/-10% 3σ taking intoaccount data path, beam variation, stitching and shot noise effects, meeting specifications for circuits designed at 64nm pitch." @default.
- W2023269538 created "2016-06-24" @default.
- W2023269538 creator A5005590008 @default.
- W2023269538 creator A5007615629 @default.
- W2023269538 creator A5011228542 @default.
- W2023269538 creator A5012967923 @default.
- W2023269538 creator A5073427918 @default.
- W2023269538 creator A5074831187 @default.
- W2023269538 date "2013-03-26" @default.
- W2023269538 modified "2023-10-12" @default.
- W2023269538 title "Matching of beams on the MAPPER MATRIX tool: a simulation study" @default.
- W2023269538 doi "https://doi.org/10.1117/12.2011500" @default.
- W2023269538 hasPublicationYear "2013" @default.
- W2023269538 type Work @default.
- W2023269538 sameAs 2023269538 @default.
- W2023269538 citedByCount "3" @default.
- W2023269538 countsByYear W20232695382015 @default.
- W2023269538 countsByYear W20232695382018 @default.
- W2023269538 crossrefType "proceedings-article" @default.
- W2023269538 hasAuthorship W2023269538A5005590008 @default.
- W2023269538 hasAuthorship W2023269538A5007615629 @default.
- W2023269538 hasAuthorship W2023269538A5011228542 @default.
- W2023269538 hasAuthorship W2023269538A5012967923 @default.
- W2023269538 hasAuthorship W2023269538A5073427918 @default.
- W2023269538 hasAuthorship W2023269538A5074831187 @default.
- W2023269538 hasConcept C105487726 @default.
- W2023269538 hasConcept C111919701 @default.
- W2023269538 hasConcept C120665830 @default.
- W2023269538 hasConcept C121332964 @default.
- W2023269538 hasConcept C121684516 @default.
- W2023269538 hasConcept C154945302 @default.
- W2023269538 hasConcept C157764524 @default.
- W2023269538 hasConcept C160633673 @default.
- W2023269538 hasConcept C195766429 @default.
- W2023269538 hasConcept C204223013 @default.
- W2023269538 hasConcept C2776190703 @default.
- W2023269538 hasConcept C41008148 @default.
- W2023269538 hasConcept C555944384 @default.
- W2023269538 hasConcept C76155785 @default.
- W2023269538 hasConcept C78371743 @default.
- W2023269538 hasConcept C9390403 @default.
- W2023269538 hasConcept C98045186 @default.
- W2023269538 hasConceptScore W2023269538C105487726 @default.
- W2023269538 hasConceptScore W2023269538C111919701 @default.
- W2023269538 hasConceptScore W2023269538C120665830 @default.
- W2023269538 hasConceptScore W2023269538C121332964 @default.
- W2023269538 hasConceptScore W2023269538C121684516 @default.
- W2023269538 hasConceptScore W2023269538C154945302 @default.
- W2023269538 hasConceptScore W2023269538C157764524 @default.
- W2023269538 hasConceptScore W2023269538C160633673 @default.
- W2023269538 hasConceptScore W2023269538C195766429 @default.
- W2023269538 hasConceptScore W2023269538C204223013 @default.
- W2023269538 hasConceptScore W2023269538C2776190703 @default.
- W2023269538 hasConceptScore W2023269538C41008148 @default.
- W2023269538 hasConceptScore W2023269538C555944384 @default.
- W2023269538 hasConceptScore W2023269538C76155785 @default.
- W2023269538 hasConceptScore W2023269538C78371743 @default.
- W2023269538 hasConceptScore W2023269538C9390403 @default.
- W2023269538 hasConceptScore W2023269538C98045186 @default.
- W2023269538 hasLocation W20232695381 @default.
- W2023269538 hasOpenAccess W2023269538 @default.
- W2023269538 hasPrimaryLocation W20232695381 @default.
- W2023269538 hasRelatedWork W1963736560 @default.
- W2023269538 hasRelatedWork W1975317019 @default.
- W2023269538 hasRelatedWork W1977883535 @default.
- W2023269538 hasRelatedWork W1981398976 @default.
- W2023269538 hasRelatedWork W1993611982 @default.
- W2023269538 hasRelatedWork W1997300579 @default.
- W2023269538 hasRelatedWork W2015450925 @default.
- W2023269538 hasRelatedWork W2025559518 @default.
- W2023269538 hasRelatedWork W2026414892 @default.
- W2023269538 hasRelatedWork W2031366215 @default.
- W2023269538 hasRelatedWork W2042817125 @default.
- W2023269538 hasRelatedWork W2051784696 @default.
- W2023269538 hasRelatedWork W2051915803 @default.
- W2023269538 hasRelatedWork W2057406128 @default.
- W2023269538 hasRelatedWork W2065233872 @default.
- W2023269538 hasRelatedWork W2075266588 @default.
- W2023269538 hasRelatedWork W2080091446 @default.
- W2023269538 hasRelatedWork W2895963162 @default.
- W2023269538 hasRelatedWork W1983832894 @default.
- W2023269538 hasRelatedWork W2526555241 @default.
- W2023269538 isParatext "false" @default.
- W2023269538 isRetracted "false" @default.
- W2023269538 magId "2023269538" @default.
- W2023269538 workType "article" @default.