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- W2023335356 abstract "Sputtered thin films of amorphous tungsten oxide were deposited onto glass substrates coated by conductive indium- tin oxide. The films were sputtered in Ar/O2 with different oxygen contents. Elastic Recoil Detection Analysis determined the density and the stoichiometry while x-ray diffraction gave evidence of the amorphous character. The films were electrochemically intercalated with lithium ions. At several intercalation levels the optical reflectance and transmittance was measured in the wavelength range 0.3 micrometers to 2.5 micrometers . We study the effect of different sputtering conditions on the coloration efficiency of the films. Films deposited at pressures of 80 mTorr showed a distinctly different absorption spectrum after intercalation, as compared to films sputtered at lower pressure. Sputtered substoichiometric tungsten oxide exhibits an absorption peak similar to the case of lithium intercalation. Substoichiometric films can be made transparent by deintercalation.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
- W2023335356 created "2016-06-24" @default.
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- W2023335356 date "2001-11-13" @default.
- W2023335356 modified "2023-09-27" @default.
- W2023335356 title "<title>Optical absorption in amorphous Li<formula><inf><roman>x</roman></inf></formula>WO<formula><inf><roman>y</roman></inf></formula> films: influence of sputtering conditions</title>" @default.
- W2023335356 doi "https://doi.org/10.1117/12.448248" @default.
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