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- W2023388253 abstract "FeS polycrystalline thin films were prepared on float glass at 500°C by radio-frequency reactive sputtering. The influence of vacuum annealing on the metal-semiconductor transition of FeS films was investigated. It has been found that with the increase of the annealing temperature from 360to600°C, the metal-semiconductor transition temperature of FeS films first decreases and then increases, associated with first a reduction and then an enhancement of hysteresis width. The thermal stress is considered to give rise to the abnormal change of the metal-semiconductor transition of the FeS film during annealing." @default.
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- W2023388253 date "2006-12-25" @default.
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- W2023388253 title "Adjustable metal-semiconductor transition of FeS thin films by thermal annealing" @default.
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