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- W2023401280 abstract "Both Langmuir probe and spatial optical emission spectroscopy (OES) measurements havebeen used to characterize the Tetra TM chrome etch chamber. Langmuir data was measured over arange of process pressures between 1.5mT and 10mT and source powers between 150W and 500W.At 350W, the data show electron and ion densities near 1 x 10 9 cm -3 for Ar and for Cl 2 /O 2 etchplasmas. Ion density trends with pressure were observed to be opposite for the two plasmas.The effect of the third electrode designed in the chamber was demonstrated to reduce iondensity by more than an order of magnitude for Ar plasma and still lower for Cl 2 /O 2 plasma.Electron temperature and plasma potential are also reduced.Radial OES measurements are reported with a new apparatus that yields direct spatialemission data. Spatial scans of infrared emission from atomic Cl were measured under a range ofseveral chamber conditions already measured with the Langmuir probe. The scans showed that theemission uniformity above the mask can be adjusted to a flat profile by selection of the processcondition." @default.
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- W2023401280 date "2009-10-01" @default.
- W2023401280 modified "2023-09-27" @default.
- W2023401280 title "Plasma characterization of Tetra III chrome etch system" @default.
- W2023401280 doi "https://doi.org/10.1117/12.833490" @default.
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