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- W2023405588 abstract "Thick tungsten coatings have been produced by chemical vapor deposition (CVD) from H2-WF6 at a temperature in the range 773-1073 K under a reduced pressure. The exper- imental set-up was designed for m situ Rarnan analysis of the gas phase (temperature and WF6 concentration) during the growth of tungsten coatings. A two dimensional mass trans- port model was proposed. It assumes a simple chemical pathway. Only the H2 reduction of WF6 on the substrate was taken into account. The major objective of the present paper is to report on ii) the experimental deposition rates and the rate values calculated by the model, iii) the values of temperature and gas phase composition deduced from Raman spectroscopy measurements and the values of these quantities obtained by numerical calculations. Within the range of process parameters investigated, the predictive capabilities of the numerical modelling are demonstrated; in addition the temperature and WF6 Partial pressure measurements can be recorded by a Rarnan equipment during the deposition process." @default.
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- W2023405588 date "1995-08-01" @default.
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- W2023405588 title "Chemical Vapor Deposition of Thick Tungsten Coatings: Mass Transport Modelling and Experiments" @default.
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- W2023405588 doi "https://doi.org/10.1051/jp3:1995182" @default.
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