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- W2023491490 abstract "Abstract Implantation of 150 keV O+ into polycrystalline beryllium provided internal standards for the trace analysis of oxygen in beryllium using secondary ion mass spectroscopy (SIMS). Four different oxygen fluences (1.3, 3.8, 13, and 38 × 1014 O cm 2 ) were used to give calculated peak oxygen concentrations of 120–3700 atomic parts per million (appm) at a depth of about 310 nm. Since the measured SIMS oxygen profiles were considerably broader than that calculated by the TRIM-86 Monte-Carlo simulation program, the known integral amounts of oxygen were used to quantify the SIMS intensities. This implantation/SIMS approach permitted reliable analysis for isolated oxygen atoms in polycrystalline beryllium matrices. For the profiling conditions employed, a detection limit of about 10 appm was established. By varying the current density of the analyzing Cs+ beam, this limit was found to be controlled by oxygen-bearing, residual gases at the surface region under analysis." @default.
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- W2023491490 date "1989-06-01" @default.
- W2023491490 modified "2023-09-30" @default.
- W2023491490 title "Implanted standards for ion microanalysis of oxygen in beryllium" @default.
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- W2023491490 doi "https://doi.org/10.1016/0168-583x(89)90714-3" @default.
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