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- W2023493054 abstract "Palladium films in the thickness range from 5 to 60 nm were evaporated at 80 K and annealed at various temperatures up to 440 K. The resistivity and the thermoelectric power of the films were measured as functions of the thickness, the annealing temperature and the measuring temperature. It is necessary to use annealing temperatures as high as 400–440 K in order to obtain films in which the resistivity (ϱ0(280 K) = 11.5 μΩ cm) and the thermoelectric power (S0(280 K) = −9.3 μV K−1) approach, when extrapolated to infinite thickness, the values of well-ordered bulk palladium (ϱ = 10.03 μΩ cm, S = −9.30 > μV K−1 at 280 K)." @default.
- W2023493054 created "2016-06-24" @default.
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- W2023493054 date "1980-01-01" @default.
- W2023493054 modified "2023-10-17" @default.
- W2023493054 title "The influence of annealing on the resistivity and the thermoelectric power of evaporated palladium films" @default.
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- W2023493054 doi "https://doi.org/10.1016/0040-6090(80)90056-5" @default.
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