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- W2023502960 abstract "The origin of larger on-state drain current (ION) variability in n-type field-effect transistors (NFETs) than that in p-type field-effect transistors (PFETs), is investigated by evaluating FETs fabricated using 65 nm technology. It is found that the larger ION variability in NFETs is caused by not only the larger threshold voltage component but also the larger current-onset voltage component of the ION variability in NFETs. Moreover, it is experimentally confirmed that ION variability of NFETs can be reduced by the halo carbon co-implantation through the reduction of threshold voltage and current-onset voltage components of the ION variability in NFETs." @default.
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- W2023502960 date "2010-10-29" @default.
- W2023502960 modified "2023-10-09" @default.
- W2023502960 title "Origin of Larger Drain Current Variability in N-Type Field-Effect Transistors Analyzed by Variability Decomposition Method" @default.
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- W2023502960 doi "https://doi.org/10.1143/apex.3.114201" @default.
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