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- W2023576310 abstract "The influence of pre-adsorbed K atoms in promoting the oxidation of a Si(100)−(2 × 1) surface has been studied using O2 molecular beams in conjunction with Auger electron spectroscopy. No reaction occurs between O2 and the clean Si(100) surface at 300 K. On the K-covered surface, SiO2 is formed after adsorption of O2 at 300 K followed by desorption of potassium at 900 K. The SiO2 formation is linearly dependent on the K coverage up to a maximum value corresponding to saturation coverage of K at 1 ML. This effect is observed at all incident beam energies between 115 and 733 meV. There is a significant increase in the reaction probability with increasing O2 beam energy. This is consistent with a reaction mechanism in which the local electrostatic forces in the vicinity of the K atoms are responsible for the promotional effect." @default.
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- W2023576310 date "1994-04-01" @default.
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- W2023576310 title "A molecular beam study of the reaction of O2 with K-covered Si(100)" @default.
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- W2023576310 doi "https://doi.org/10.1016/0039-6028(94)90402-2" @default.
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