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• W2023590806 abstract "Magnetron-sputtered, 150 - 500 nm thick chromium nitride films of CrN and stoichiometry were exposed to air at 500 - . Oxide scale growth and morphology and the phase transformations during oxidation were investigated by means of Rutherford backscattering spectrometry, resonant nuclear reaction analysis, scanning force microscopy (SFM) and x-ray diffraction. A combined logarithmic and parabolic scale growth was found and interpreted as due to inwards diffusion of oxygen via grain boundaries (logarithmic) and outwards lattice diffusion of Cr (parabolic). Pt-marker experiments confirmed this interpretation. The activation energies of the two processes were determined to be Q = 60(20) and . During oxidation of a transformation into CrN was observed. A linear increase in the surface roughness and surface grain size with the oxide layer thickness was found by SFM." @default.
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• W2023590806 date "1996-12-02" @default.
• W2023590806 modified "2023-10-14" @default.
• W2023590806 title "Oxidation of thin chromium nitride films: kinetics and morphology" @default.
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• W2023590806 doi "https://doi.org/10.1088/0953-8984/8/49/055" @default.
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