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- W2023603575 abstract "Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting reactions, ALD offers exceptional conformality on high-aspect ratio structures, thickness control at the Angstrom level, and tunable film composition. With these advantages, ALD has emerged as a powerful tool for many industrial and research applications. In this review, we provide a brief introduction to ALD and highlight select applications, including Cu(In,Ga)Se2 solar cell devices, high-k transistors, and solid oxide fuel cells. These examples are chosen to illustrate the variety of technologies that are impacted by ALD, the range of materials that ALD can deposit – from metal oxides such as Zn1−xSnxOy, ZrO2, Y2O3, to noble metals such as Pt – and the way in which the unique features of ALD can enable new levels of performance and deeper fundamental understanding to be achieved." @default.
- W2023603575 created "2016-06-24" @default.
- W2023603575 creator A5026349013 @default.
- W2023603575 creator A5045638894 @default.
- W2023603575 creator A5058089732 @default.
- W2023603575 date "2014-06-01" @default.
- W2023603575 modified "2023-10-17" @default.
- W2023603575 title "A brief review of atomic layer deposition: from fundamentals to applications" @default.
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- W2023603575 doi "https://doi.org/10.1016/j.mattod.2014.04.026" @default.
- W2023603575 hasPublicationYear "2014" @default.
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