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• W2023616895 abstract "Vacuum ultraviolet (VUV) photons are known to modify the bulk chemical composition of 193 nm photoresist, typically penetrating ~100 nm and depleting carbon–oxygen bonds. Fourier transform infrared transmission measurements as a function of VUV photon fluence demonstrate that VUV-induced bond breaking occurs over a period of time. We present a model based on the idea that VUV photons initially deplete near-surface O-containing bonds, leading to deeper, subsequent penetration and more bond losses, until the remaining near-surface C–C bonds are able to absorb the incident radiation. Fitted model photoabsorption cross-sections compare well with the literature values." @default.
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• W2023616895 date "2009-07-07" @default.
• W2023616895 modified "2023-09-23" @default.
• W2023616895 title "Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist" @default.
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• W2023616895 doi "https://doi.org/10.1088/0022-3727/42/15/152001" @default.
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