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- W2023634522 abstract "A nanometric electron beam lithography system was developed with 0.1 um resolution using 0.03 μm electron beam. To get practical writing speed of 1 wafer/ hr with 0.1 μm resolution, many new technologies were developed in the system. Here, the high speed data control circuit is precisely described. It consists of a pattern generator (a buffer memory, a framing processor, decomposition processor and correction processor ) and a beam deflection controller." @default.
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- W2023634522 date "1988-06-14" @default.
- W2023634522 modified "2023-09-27" @default.
- W2023634522 title "High Speed Data Control Circuit For Nanometric Electron Beam Lithography" @default.
- W2023634522 doi "https://doi.org/10.1117/12.945657" @default.
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