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- W2023637984 abstract "The in situ crystallization technique has been utilized to fabricate zirconium phenylphosphonate (ZrPP) films with their hexagonal crystallite perpendicular to the copper substrate. The micro/nano roughness surface structure, as well as the intrinsic hydrophobic characteristic of the surface functional groups, affords ZrPP films excellent hydrophobicity with water contact angle (CA) ranging from 134° to 151°, without any low-surface-energy modification. Particularly, in the corrosive solutions such as acidic or basic solutions over a wide pH from 2 to 12, no obvious fluctuation in CA was observed for all the ZrPP film. The k values of the hydrophobic ZrPP films are in the low-k range (k < 3.0), meeting the development of ultra-large-scale integration (ULSI) circuits. The hydrophobicity feature is proposed to bear ZrPP film a more stable low-k value in an ambient atmosphere. Besides, the polarization current of ZrPP films is reduced by 2 orders of magnitude, compared to that of the untreated copper substrate. Even deposited in a vacuum oven for 30 days at room temperature, ZrPP films also show excellent corrosion resistance, indicating a stable anticorrosion property." @default.
- W2023637984 created "2016-06-24" @default.
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- W2023637984 date "2009-08-03" @default.
- W2023637984 modified "2023-10-16" @default.
- W2023637984 title "<i>In Situ</i> Crystallized Zirconium Phenylphosphonate Films with Crystals Vertically to the Substrate and Their Hydrophobic, Dielectric, and Anticorrosion Properties" @default.
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- W2023637984 doi "https://doi.org/10.1021/la901981y" @default.
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