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- W2023653141 abstract "Abstract The electrical resistivity of a silicon nanowire formed from Si 2 H 6 by CVD was measured using microprobes equipped with SEM. The resistivity of 6.58 × 10 5 Ω cm at room temperature was obtained from the current–voltage ( I – V ) curve for the wire with both ends fused to the probes. The non-linear I – V curve measured only by contacting the wire with the probes could be explained by the resistivity in a series of silicon and dielectric thin oxide films formed on the silicon nanowires." @default.
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- W2023653141 date "2009-01-01" @default.
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- W2023653141 title "Electrical conductivity measurement of silicon wire prepared by CVD" @default.
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- W2023653141 doi "https://doi.org/10.1016/j.cplett.2008.11.090" @default.
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