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- W2023755325 abstract "Using a grating pattern of parallel nitride and oxide stripes on the silicon surface, self-interstitial concentration at the Si/SiO2 interface is accurately determined by means of oxidation-induced stacking fault growth observation. The results show that the interstitial concentration at the interface is found to be determined by the oxidation of interstitials in the oxide rather than self-interstitial diffusion in bulk silicon. A newly proposed physical model incorporates the balance among the generation rate of interstitials at the oxidizing interface, the annihilation rate of interstitials due to surface regrowth, and the rate at which they diffuse into the oxide and react with incoming oxidants. For higher oxidation rates, the model predicts that the interstitial concentration follows a 0.5 power dependence on oxidation rate. For slower oxidation rates, the concentration at the interface becomes lower than the equilibrium interstitial concentration, leading to the oxidation-retarded diffusion of dopants with a high fractional interstitialcy diffusion component." @default.
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- W2023755325 date "1989-04-01" @default.
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- W2023755325 title "Theoretical model for self-interstitial generation at the Si/SiO2 interface during thermal oxidation of silicon" @default.
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- W2023755325 doi "https://doi.org/10.1063/1.342759" @default.
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