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- W2023779633 abstract "Getter sputtering with substrate temperatures as low as 18 °K was achieved by sputtering in helium gas with liquid helium circulating through the substrate table. This technique is effective in producing amorphous films from usually crystalline materials as a result of the low deposition temperature and of the high helium gas pressure necessary to obtain a sputtering current." @default.
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- W2023779633 date "1978-02-01" @default.
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- W2023779633 title "Getter sputtering at low temperature (≃20 °K)" @default.
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- W2023779633 doi "https://doi.org/10.1063/1.89969" @default.
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