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- W2023804086 abstract "We try to study the epitaxial ZnSe re-growth on lift-off ZnSSe epilayer. First, the ZnSSe lift-off technique from ZnSSe/GaAs substrate was investigated. The ZnSSe/GaAs wafer was glued on an indium/glass substrate and an etching solution of NH4OH (30%):H2O2 (30%)=9:1 was used for the lift-off of ZnSSe epilayer. From photoluminescence examination, the intensities of the near-band and broad-band emission of ZnSSe epilayer increased from the reflection of In mirror after the lift-off. Re-growth of ZnSSe epilayers on ZnSSe/indium/glass substrate at 220°C was studied by metalorganic vapor-phase epitaxy. The near-band emission is stronger and the broad-band emission decreases after re-growth. It shows a near-band emission emission at 438 nm with an FWHM of 26.8 meV at 77 K. It means that a high-quality re-grown ZnSe epilayer can be obtained." @default.
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- W2023804086 date "2001-12-01" @default.
- W2023804086 modified "2023-10-18" @default.
- W2023804086 title "Lift-off and re-growth of ZnSSe epilayer" @default.
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- W2023804086 doi "https://doi.org/10.1016/s1369-8001(02)00027-6" @default.
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