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• W2023882334 abstract "The use of an attenuated total reflect ion-coup ling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments." @default.
• W2023882334 created "2016-06-24" @default.
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• W2023882334 date "2008-07-01" @default.
• W2023882334 modified "2023-09-23" @default.
• W2023882334 title "The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling" @default.
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• W2023882334 doi "https://doi.org/10.1088/1674-1056/17/7/025" @default.
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