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- W2024013656 abstract "The copolymers containing a carboxyl group were used as the two-component photopolymers in combination with dimethyl 4-(o-nitrophenyl)-2,6-dimethyl-1,4-dihydro-3,5-pyridinedicarboxylate (NMHP) as a photobase generator. Under irradiation by 365 nm light, NMHP is converted to dimethyl 4-(o-nitrosophenyl)-2,6-dimethyl-3,5-pyridinedicarboxylate (NMP). NMP acts as a base catalyst for the thermal decarboxylation of a carboxyl group in the polymer. The decarboxylation in the polymer provides a negative-working photoresist under the additional flood-exposure of 365 nm light before development. This process is called the photoassisted contrast (PAC) process. NMHP acts as a dissolution inhibitor for the aqueous base development of the polymers containing a carboxyl group but NMP promotes the dissolution of the polymers. This change in the solubility inhibition of NMHP offers a positive-working photoresist without the process of post-exposure baking (PEB) and the PAC process. Therefore, NMP, the photoproduct of NMHP, produces dual-tone-mode photoresists with the copolymers containing a carboxyl group. © 1998 John Wiley & Sons, Ltd." @default.
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- W2024013656 date "1998-06-01" @default.
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- W2024013656 title "Novel dual-mode photoresist based on decarboxylation by photogenerated base compound" @default.
- W2024013656 doi "https://doi.org/10.1002/(sici)1099-1581(199806)9:6<326::aid-pat785>3.0.co;2-5" @default.
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