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• W2024059077 abstract "Highly textured yttria-stabilized ZrO2 films have been deposited using rf diode sputtering from a single polycrystalline target. These films were deposited on oxidized silicon substrates at substrate temperatures up to 600 °C using a 90% argon and 10% oxygen sputtering gas mixture. The films crystallized in the cubic phase and were large grained (d∼500 Å). Films deposited above 500 °C exhibit extreme (100) texturing while films deposited without substrate heating exhibit extreme (111) texturing. The effect of oxygen annealing on the crystal structure of these films has also been studied." @default.
• W2024059077 created "2016-06-24" @default.
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• W2024059077 date "1991-08-15" @default.
• W2024059077 modified "2023-09-26" @default.
• W2024059077 title "Deposition of textured yttria‐stabilized ZrO₂films on oxidized silicon" @default.
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• W2024059077 doi "https://doi.org/10.1063/1.349464" @default.
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