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- W2024069091 abstract "A study was made of electromigration-induced short circult failure in multilevel metal structures. The material chosen for this study was Al deposited on a layer of TiW, a metallization prone to the formation of whiskers during current stress. The dominant failure mode was found to be interlayer metal shorts. Experiments were performed to examine the relationship between short circuit lifetime and temperature, current density, and interlayer dielectric thickness." @default.
- W2024069091 created "2016-06-24" @default.
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- W2024069091 date "1985-03-01" @default.
- W2024069091 modified "2023-10-03" @default.
- W2024069091 title "Electromigration-Induced Short Circuit Failure" @default.
- W2024069091 doi "https://doi.org/10.1109/irps.1985.362080" @default.
- W2024069091 hasPublicationYear "1985" @default.
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