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• W2024077432 abstract "Optical properties of Si partially amorphized by As+-ion implantation have been studied by means of the two-phase mixture Bruggeman effective-medium approximation in which the partially amorphized layer is assumed as a physical mixture of fully amorphous Si and crystalline Si. The dielectric functions of the crystalline components deduced from this study differ appreciably from that of the bulk crystalline Si, especially in the vicinity of the sharp critical point (CP) features. We find that the change in the optical properties of the crystalline component is due to the increase in the broadening parameters of the CPs caused by implantation-induced damage. The amorphous volume fraction fa is also found to be simply expressed as fa=([As+]/A)α, where [As+] is the ion fluence (150-keV As+ ions), A (=1×1015 cm−2) is an amorphization-threshold fluence (i.e., the minimum fluence required to form a fully amorphous layer), and α (=0.46) is an amorphization-rate factor of the incident ions. Dielectric-function-related optical data of partially amorphized Si, such as the complex refractive index, the absorption coefficient, and the normal-incidence reflectivity, are also presented as a byproduct of the present analysis." @default.
• W2024077432 created "2016-06-24" @default.
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• W2024077432 date "1992-04-01" @default.
• W2024077432 modified "2023-10-14" @default.
• W2024077432 title "Optical properties of Si partially amorphized by ion implantation" @default.
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• W2024077432 doi "https://doi.org/10.1063/1.350951" @default.
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