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- W2024119906 abstract "The electron spin resonance (ESR) observation of an isotropic signal of g = 2.00246 ± 0.000 03 in as-grown (111)Si/SiO2 is reported. These structures were thermally grown in dry O2 (≈1.1 atm) at temperatures Tox = 700−850°C, the maximum signal intensity being observed for Tox ≈ 800°C. The defect is characterized by a narrow symmetric signal of 1.0G peak-to-peak width and a 29Si hyperfine doublet of splitting ahf = 16.1G. Etch back experiments have shown it to reside in the a-SiO2 layer. Analysis of the salient ESR properties suggest that the originating defect is intrinsic to SiO2, with the unpaired spin occupying an effectively highly s-like state." @default.
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- W2024119906 date "1992-06-01" @default.
- W2024119906 modified "2023-10-17" @default.
- W2024119906 title "New isotropic defect in as-oxidized thermal (111)Si/SiO2 revealed by electron spin resonance" @default.
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- W2024119906 doi "https://doi.org/10.1016/0038-1098(92)90170-e" @default.
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