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- W2024334486 abstract "Electron-beam induced deposition has been shown to be capable of creating structures of nanometer size in three dimensions without supplementary process steps like lift-off or etching procedures. Tips can be produced with radii of curvature comparable to the beam diameter used for deposition, i.e., some nanometers. By choosing appropriate deposition conditions, vacuum field emitter tips yielding a current of more than one hundred micro amps at 22 V gate voltage have been fabricated. This article will discuss the decomposition process of different organometallic precursor molecules by electron impact. A Monte Carlo simulation is employed to model the scattering of the primary electrons in a tip and to compute the spatial distribution of energy left in the tip. The influence of beam energy, beam current, and precursor material on the morphology and electrical properties of the deposited material are highlighted." @default.
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- W2024334486 date "1995-03-01" @default.
- W2024334486 modified "2023-10-12" @default.
- W2024334486 title "Electron-beam induced deposition for fabrication of vacuum field emitter devices" @default.
- W2024334486 doi "https://doi.org/10.1116/1.588333" @default.
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