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- W2024355344 abstract "Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss." @default.
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- W2024355344 date "2009-01-01" @default.
- W2024355344 modified "2023-09-23" @default.
- W2024355344 title "Photolithography of Thick Photoresist Coating in Anisotropically Etched V-grooves for Electrically Controlled Liquid Crystal Photonic Bandgap Fiber Devices" @default.
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- W2024355344 doi "https://doi.org/10.1364/nfoec.2009.jwa2" @default.
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