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- W2024355924 abstract "Abstract This research investigates the effect of ion implantation dosage level and further thermal treatment on the physical characteristics of chromium coatings on Si(1 1 1) substrates. Chromium films had been exposed to nitrogen ion fluencies of 1 × 10 17 , 3 × 10 17 , 6 × 10 17 and 10 × 10 17 N + cm −2 with a 15 keV energy level. Obtained samples had been heat treated at 450 °C at a pressure of 2 × 10 −2 Torr in an argon atmosphere for 30 h. Atomic force microscopy (AFM) images showed significant increase in surface roughness as a result of nitrogen ion fluence increase. Secondary ion mass spectroscopy (SIMS) studies revealed a clear increased accumulation of Cr 2 N phase near the surface as a result of higher N + fluence. XRD patterns showed preferred growth of [0 0 2] and [1 1 1] planes of Cr 2 N phase as a result of higher ion implantation fluence. These results had been explained based on the nucleation-growth of Cr 2 N phase and nitrogen atoms diffusion history during the thermal treatment process." @default.
- W2024355924 created "2016-06-24" @default.
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- W2024355924 date "2006-07-01" @default.
- W2024355924 modified "2023-09-23" @default.
- W2024355924 title "Study of nitrogen ion implantation and diffusion phenomena on thin chromium layers followed by the atomic force microscopy and secondary ion mass spectroscopy techniques characterization" @default.
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- W2024355924 doi "https://doi.org/10.1016/j.apsusc.2005.09.076" @default.
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