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- W2024418717 abstract "Aluminium nitride coating was obtained with the stationary vacuum arc source with separation (filtration) of aluminium plasma flow and nitrogen leak-in into the vacuum chamber at substrate temperature 313–673 K. The growth rate was 5–7 μm/h. The crystal structure of aluminium nitride films with thickness 10–30 nm deposited on monocrystalline NaCl substrate was studied by electron diffraction method. The aluminium nitride coatings with thickness 1–3 μm were investigated by X-ray examination methods. It was determined that the aluminium nitride coating with the thickness up to 30 nm has amorphous structure through the whole deposition temperature range. At the film thickness exceeding 1 μm the coating structure is crystalline with hexagonal lattice. The microhardness of the aluminium nitride coating was 18–20 GPa and their resistivity was 1–2×1011 Ω cm. The aluminium nitride coating with thickness 1–3 μm deposited on stainless steel samples preserves them from high temperature oxidation up to 1473 K. It was found out by forcing an indenter and by scribing that the aluminium nitride coating obtained at the mentioned substrate temperatures possesses good adhesion to steel, titanium, silicon, glass, sapphire substrates. Studies of optical characteristics of the aluminium nitride coating showed the possibility of its application as optically sensitive coating." @default.
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- W2024418717 date "2001-03-01" @default.
- W2024418717 modified "2023-09-25" @default.
- W2024418717 title "Properties of aluminium nitride coating obtained by vacuum arc discharge method with plasma flow separation" @default.
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- W2024418717 doi "https://doi.org/10.1016/s0925-9635(00)00577-x" @default.
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