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• W2024429224 abstract "A great deal of intensive research has been conducted to obtain high-quality transparent ultralow-refractive-index and ultralow-dielectric-constant thin films for microptics and microelectronics applications. Here, we report a simple procedure to prepare highly porous silica thin films with high optical quality and water resistance through nano-etching of mesoporous silica films followed by fluoroalkylsilane surface modification. The films possess an ultralow refractive index of 1.03 (800&#xA0;nm) and an ultralow dielectric constant of 1.30 (100&#xA0;kHz), to our knowledge the lowest values ever reported in thin film materials. The films are superhydrophobic (water contact angle=156&#x2009;&#x2009;deg), thus exhibit high moisture stability." @default.
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• W2024429224 date "2012-04-19" @default.
• W2024429224 modified "2023-09-27" @default.
• W2024429224 title "Ultralow-refractive-index optical thin films through nanoscale etching of ordered mesoporous silica films" @default.
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• W2024429224 doi "https://doi.org/10.1364/ol.37.001406" @default.
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