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- W2024508229 abstract "Fluoropolymers are key materials for single layer resists of 157nm lithography. We have been studying fluoropolymers to identify their potential for base resins of 157nm photoresist. Many fluoropolymers showed high optical transparencies, with absorption coefficients of 0.01micrometers <SUP>-1</SUP> to 2micrometers <SUP>-1 at 157nm, and dry- etching resistance comparable to an ArF resist, and non- swelling solubility in the standard developer. Positive- tone resists were formulated using fluoropolymers that fulfill practical resist requirements. They showed good sensitivities, from 1 mJ/cm(superscript 2</SUP> to 10 mJ/cm<SUP>2</SUP>, and contrast in the sensitivity curves. They were able to be patterned using a F<SUB>2</SUB> laser microstepper." @default.
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- W2024508229 date "2001-08-24" @default.
- W2024508229 modified "2023-09-23" @default.
- W2024508229 title "Resist materials for 157-nm lithography" @default.
- W2024508229 doi "https://doi.org/10.1117/12.436868" @default.
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